Apparatus and methods for exhaust cleaning

Abstract

Embodiments of the present disclosure relate to an apparatus for cleaning an exhaust path of a semiconductor process tool. One embodiment includes an exhaust pipe section and a residue remover including an inner opening through which exhaust gas may pass, and the residue remover is disposed in the exhaust pipe section and is operable to move. A gas-liquid separator is connected to the residue remover downstream from the residue remover and upstream from a factory exhaust. The gas-liquid separator includes a first pipe section including a first port passing through a side of the first pipe section for exhausting gas. A first deflector above the first port and extending from the side of the first pipe section above the first port, and a second deflector below the first deflector, entirely below the first port, and extending from the side of the first pipe section below the first port.