Wei Chang Cheng

Title: Wei Chang Cheng and Semiconductor Exhaust-Cleaning Innovation.

Introduction

Wei Chang Cheng is an inventor based in Hsinchu, Taiwan. His patent work includes an invention for cleaning exhaust paths in semiconductor process tools. The available information identifies him as working at Taiwan Semiconductor Manufacturing Co., Ltd.

Latest Patents

Cheng is associated with 1 patent, titled “Apparatus and Methods for Exhaust Cleaning.” The patent describes an apparatus designed to remove residue from the exhaust path of a semiconductor process tool. It includes a movable residue remover positioned within an exhaust pipe section, allowing exhaust gas to pass through its inner opening.

Downstream, a gas-liquid separator connects the residue remover to the factory exhaust. The separator’s first pipe section has a side port for exhausting gas, with deflectors positioned above and below the port. These components form part of the disclosed approach to managing exhaust and residue in semiconductor manufacturing.

Career Highlights

Cheng’s identified patent reflects work on equipment and methods relevant to semiconductor-process exhaust systems. The invention focuses on residue removal and gas-liquid separation within the exhaust path.

Collaborations

Cheng’s listed coworker is Cheng-kuang Chen. The available information does not specify the coworker’s role in the patent or the nature of their collaboration.

Conclusion

Wei Chang Cheng’s patent describes a semiconductor exhaust-cleaning apparatus that combines a movable residue remover with a gas-liquid separator, addressing residue management in process-tool exhaust systems.