This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Cheng-kuang Chen: Semiconductor Process and Photomask Innovations.
Introduction
Cheng-kuang Chen is an inventor based in Hsinchu, Taiwan. His patent work addresses semiconductor manufacturing, including exhaust cleaning and photomask inspection. The supplied information lists 2 patents.
Latest Patents
“Apparatus and Methods for Exhaust Cleaning” describes equipment for cleaning the exhaust path of a semiconductor process tool. The disclosed system includes a movable residue remover within an exhaust pipe section and a downstream gas-liquid separator. Deflectors positioned around a gas-exhaust port help guide the flow through the separator.
“Photomask and Method for Inspecting Photomask” describes a photomask with multiple pattern areas and an adjacent training area. A training feature is designed to be comparable to a mask feature, supporting inspection of photomask patterns.
Career Highlights
Chen’s listed company affiliations include Taiwan Semiconductor Manufacturing Company Limited. His patent subjects reflect work related to semiconductor process equipment and photomask inspection.
Collaborations
The supplied information names Chien-hung Lai and Hao-ming Chang as Chen’s coworkers. It does not specify their roles in the listed patents.
Conclusion
Cheng-kuang Chen’s listed inventions focus on practical challenges in semiconductor manufacturing, particularly exhaust-path cleaning and photomask inspection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile