Introduction: Tzong-Sheng Chang, based in Chubei, Taiwan, stands out as an inventive force in the semiconductor industry. With an impressive portfolio of 36 patents, he has made significant contributions to technology that advance device fabrication and semiconductor structures.

Latest Patents: Among his recent technological innovations are two noteworthy patents. The first is a "Method of Fabricating Reticle," which details a process involving the receipt of a device design layout alongside a surrounding scribe line design layout. This method rotates both layouts in opposing directions and performs an optical proximity correction (OPC) process, culminating in the formation of a reticle that integrates both designs. The second patent is titled "Semiconductor Structure with Data Storage Structure and Method for Manufacturing the Same." This invention presents a semiconductor structure composed of a substrate featuring a gate structure and two source/drain structures. It also includes an interlayer dielectric layer and conductive structures strategically placed to enhance functionality and performance in semiconductor devices.

Career Highlights: Tzong-Sheng Chang is currently affiliated with Taiwan Semiconductor Manufacturing Company (TSMC), a leading entity within the semiconductor sector. His role involves leveraging his expertise in semiconductor innovation to push the boundaries of technology.

Collaborations: Throughout his career, Tzong-Sheng has collaborated with esteemed colleagues such as Bor-Zen Tien and Kuang-Hsin Chen, reflecting a commitment to teamwork and innovation in developing advanced semiconductor solutions.

Conclusion: Tzong-Sheng Chang's impactful patents underscore his position as a significant inventor in the semiconductor field. His work not only exemplifies innovation but also contributes to the continuous advancement of technology, shaping the future of device manufacturing.

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