The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
May. 07, 2015
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Hsueh-Yi Chung, Zhubei, TW;
Yung-Cheng Chen, Jhubei, TW;
Fei-Gwo Tsai, Taipei, TW;
Chi-Hung Liao, New Taipei, TW;
Shih-Chi Fu, Zhudong Township, TW;
Wei-Ti Hsu, Zhubei, TW;
Jui-Ping Chuang, Hsinchu, TW;
Tzong-Sheng Chang, Chubei, TW;
Kuei-Shun Chen, Hsinchu, TW;
Meng-Wei Chen, Taichung, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.