This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Lithography Technology. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Chunghwa Picture Tubes, Ltd.. Active years: 2010-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hsin-Chu, TW (2010 - 2012)
- Taichung County, TW (2013)
- Taoyuan County, TW (2013 - 2014)
- Jhubei, TW (2010 - 2018)
- Hsinchu County, TW (2020 - 2023)
Company Filing History:
17 out of 42,926 
3 out of 980 Years Active: 2010-2026
Areas of Expertise:
Title: Yung-Cheng Chen: Innovator in EUV Lithography
Introduction
Yung-Cheng Chen is a prominent inventor based in Jhubei, Taiwan, known for his significant contributions to the field of lithography. With a total of 19 patents to his name, he has made remarkable advancements in technology that are crucial for semiconductor manufacturing.
Latest Patents
Among his latest patents is an EUV lithography apparatus and operating method for mitigating contamination. This innovative apparatus includes a light source that generates an extreme ultraviolet (EUV) light beam, a scanner that directs the light to a reticle stage, and a debris catcher designed to capture contaminants along the EUV beam path. The debris catcher features a network membrane composed of numerous nano-fibers, enhancing its efficiency. Another notable patent involves methods for cleaning lithography masks. This method allows for the removal of haze defects from photomasks or reticles by placing them in a chamber filled with a hydrogen atmosphere and exposing them to radiation. The combination of radiation energy and hydrogen effectively decomposes haze defects, enabling quick on-site cleaning without the need for wet chemicals.
Career Highlights
Yung-Cheng Chen has worked with leading companies in the industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Chunghwa Picture Tubes Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in lithography technology.
Collaborations
Throughout his career, Chen has collaborated with notable colleagues such as Chin-Hsiang Lin and Chih-Wei Lin. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Yung-Cheng Chen's contributions to EUV lithography and his innovative methods for cleaning photomasks have established him as a key figure in the semiconductor industry. His work continues to influence advancements in technology, showcasing the importance of innovation in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile