The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2014

Filed:

Feb. 09, 2010
Applicants:

Tsung-chih Chien, Caotun Township, Nantou County, TW;

Yung-cheng Chen, Jhubei, TW;

Heng-jen Lee, Baoshan Township, Hsinchu County, TW;

Inventors:

Tsung-Chih Chien, Caotun Township, Nantou County, TW;

Yung-Cheng Chen, Jhubei, TW;

Heng-Jen Lee, Baoshan Township, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/74 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a controller. The wafer spin device supports a wafer for processing. The optical system directs exposure light on a respective edge portion of the wafer simultaneously to create a dummy track on the edge of the wafer. The scanner interface module sends and/or receives dummy edge exposure information from a scanner via a computer network. The controller receives the dummy edge exposure information from the scanner interface module and uses the exposure information to control the optical system.


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