Hsueh-Yi Chung

Title: Hsueh-Yi Chung: Innovator in Semiconductor Fabrication

Introduction

Hsueh-Yi Chung is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding a total of 7 patents. His work focuses on innovative methods that enhance the efficiency and precision of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, one notable invention is a method of fabricating a reticle. This method involves receiving a device design layout and a scribe line design layout that surrounds the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is then performed on the rotated layouts, resulting in the formation of a reticle that includes both layouts. Another significant patent describes a method for exposing a wafer substrate. This method includes forming a reticle with a device pattern and determining the relative orientation between the device pattern and a mask field of an exposure tool based on mask field utilization. The reticle is loaded onto the exposure tool, and the wafer substrate is rotated according to the orientation of the device pattern. Radiation is then projected through the reticle onto the rotated wafer substrate, effectively imaging the device pattern.

Career Highlights

Hsueh-Yi Chung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas and contribute to advancements in semiconductor technology.

Collaborations

He has collaborated with notable colleagues, including Fei-Gwo Tsai and Jui-Ping Chuang, who share his commitment to innovation in the semiconductor field.

Conclusion

Hsueh-Yi Chung's contributions to semiconductor fabrication through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the industry. His methods continue to influence the efficiency and effectiveness of semiconductor manufacturing processes.