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For the Inventor, By the Inventor

Iwate, Japan

Masato Yonezawa

This inventor holds 13 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Tokyo Electron Limited, Air Products and Chemicals, Inc., Mitsubishi Electric Corporation. Active years: 2008-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Yonezawa. Retrieved from https://idiyas.com/inventor/masato-yonezawa-7lppcbzc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13 

% Patents Active = 92.3


Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 93(Granted Patents)


Location History:

  • Tokyo, JP (2008 - 2011)
  • Nirasaki, JP (2011 - 2013)
  • Iwate, JP (2016 - 2022)
  • Oshu, JP (2019 - 2022)

Company Filing History:

goldMedal10 out of 10,933 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 3,220 
 
Air Products and Chemicals, Inc.
 patents
bronzeMedal1 out of 16,627 
 
Mitsubishi Electric Corporation
 patents
4. 1 out of 103 
 
Tokyo Electron Limi Ted
 patents

Years Active: 2008-2022

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13 patents (USPTO):Explore Patents
1. 11390948 - Film forming apparatus (2022-07-19),
2. 11328901 - Deposition method (2022-05-10),
3. 10668512 - Particle removal method and substrate processing method (2020-06-02),
4. 10385453 - Film forming apparatus (2019-08-20),
5. 10103009 - Plasma processing device and operation method (2018-10-16),
6. 9865454 - Substrate processing apparatus and substrate processing method (2018-01-09),
7. 9376751 - Plasma processing device and operation method (2016-06-28),
8. 8563096 - Vertical film formation apparatus and method for using same (2013-10-22),
9. 8298628 - Low temperature deposition of silicon-containing films (2012-10-30),
10. 8216648 - Film formation method and apparatus (2012-07-10),
11. 8012787 - Photovoltaic device and manufacturing method thereof (2011-09-06),
12. 7953512 - Substrate processing system, control method for substrate processing apparatus and program stored on medium (2011-05-31),
13. 7462376 - CVD method for forming silicon nitride film (2008-12-09),

Title: The Innovative Journey of Masato Yonezawa

Introduction: Masato Yonezawa is a pioneering inventor hailing from Iwate, Japan. His dedication to innovation and problem-solving has led to remarkable contributions in various fields.

Latest Patents: Masato Yonezawa's recent patents focus on cutting-edge technologies in the automotive industry, particularly in the development of electric vehicle components that enhance efficiency and sustainability.

Career Highlights: With a background in mechanical engineering, Masato Yonezawa has spent over two decades refining his craft in the realm of automotive innovation. His work has been instrumental in advancing the capabilities of electric vehicles and reducing their environmental impact.

Collaborations: Throughout his career, Masato Yonezawa has collaborated with leading research institutions and automotive companies to bring his inventions to life. His ability to work in multidisciplinary teams has resulted in groundbreaking solutions that push the boundaries of technological advancement.

Conclusion: Masato Yonezawa's relentless pursuit of innovation and his passion for creating a more sustainable future through his inventions make him a true trailblazer in the world of automotive engineering. His work continues to inspire and shape the future of transportation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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