The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2020
Filed:
Dec. 14, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/02 (2006.01); B05B 1/18 (2006.01); H01L 21/02 (2006.01); H01L 21/465 (2006.01); B05D 1/00 (2006.01); H01L 21/311 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
B08B 5/02 (2013.01); B05B 1/18 (2013.01); B05D 1/00 (2013.01); C23C 16/4405 (2013.01); C23C 16/45542 (2013.01); C23C 16/45551 (2013.01); C23C 16/45565 (2013.01); H01J 37/32357 (2013.01); H01L 21/0206 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02263 (2013.01); H01L 21/02274 (2013.01); H01L 21/31116 (2013.01); H01L 21/465 (2013.01);
Abstract
A particle removal method is provided for removing particles on a film etched using a fluorine-containing gas. In the method, a mixed gas of an activated oxygen-containing gas and hydrogen gas added to the activated oxygen-containing gas is supplied to the etched film.