The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Nov. 26, 2010
Masanobu Matsunaga, Nirasaki, JP;
Pao-hwa Chou, Nirasaki, JP;
Masato Yonezawa, Nirasaki, JP;
Masayuki Hasegawa, Nirasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Masanobu Matsunaga, Nirasaki, JP;
Pao-Hwa Chou, Nirasaki, JP;
Masato Yonezawa, Nirasaki, JP;
Masayuki Hasegawa, Nirasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for using a vertical film formation apparatus includes performing a coating process inside the process container without product target objects present therein to cover an inner surface of the process container with a coating film, and then performing a film formation process inside the process container accommodating the holder with the product target objects placed thereon to form a predetermined film on the product target objects. The coating process alternately supplies the first and second process gases into the process container without turning either of the first and second process gases into plasma. The film formation process alternately supplies the first and second process gases into the process container while turning at least one of the first and second process gases into plasma.