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For the Inventor, By the Inventor

Nirasaki, Japan

Masayuki Hasegawa

This inventor holds 6 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2009-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Hasegawa. Retrieved from https://idiyas.com/inventor/masayuki-hasegawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 83.3

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Kofu, JP (2009)
  • Nirasaki, JP (2012 - 2013)
  • Oshu, JP (2014)
  • Iwate, JP (2018)

Company Filing History:

goldMedal6 out of 10,918 
 
Tokyo Electron Limited
 patents

Years Active: 2009-2018

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6 patents (USPTO):Explore Patents
1. 10151028 - Film deposition apparatus (2018-12-11),
2. 8703000 - Slimming method of carbon-containing thin film and oxidation apparatus (2014-04-22),
3. 8563096 - Vertical film formation apparatus and method for using same (2013-10-22),
4. 8461059 - Batch CVD method and apparatus for semiconductor process (2013-06-11),
5. 8216648 - Film formation method and apparatus (2012-07-10),
6. 7559992 - Semiconductor processing apparatus and method (2009-07-14),

Title: The Innovative Mind of Masayuki Hasegawa

Introduction

Masayuki Hasegawa, an accomplished inventor based in Nirasaki, Japan, has made significant contributions to the field of technology with a portfolio of six patents. His work primarily focuses on advancements in film deposition and oxidation techniques, crucial for various applications in semiconductor manufacturing.

Latest Patents

Among his latest innovations is a film deposition apparatus that enhances the efficiency of depositing films on substrates. This apparatus features a vacuum chamber and a specialized turntable designed to hold substrates securely while maintaining optimal conditions for film deposition. Another notable patent is the slimming method for carbon-containing thin films. This method involves the oxidation of patterned carbon films to refine protrusions on their surfaces, which holds great potential for improving the performance of electronic devices.

Career Highlights

Hasegawa works at Tokyo Electron Limited, a leading company in providing manufacturing equipment for the semiconductor industry. His expertise in developing advanced apparatuses and methods has positioned him as a prominent figure in the innovation landscape, driving forward the capabilities of film deposition and oxidation processes.

Collaborations

Throughout his career, Hasegawa has collaborated with talented individuals such as Masanobu Matsunaga and Pao-Hwa Chou. These collaborations have played a vital role in enhancing his research and innovations, contributing to breakthroughs that leverage both foundational science and cutting-edge technology.

Conclusion

Masayuki Hasegawa stands as a figure of innovation in the field of manufacturing technology. His contributions, particularly relating to film deposition and oxidation techniques, reflect a deep understanding of both theoretical and practical aspects of the industry. With continued advancements in his work, he not only enhances the functionality of technological applications but also inspires future innovations in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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