The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2013
Filed:
Jul. 19, 2010
Toshiyuki Ikeuchi, Nirasaki, JP;
Masayuki Hasegawa, Nirasaki, JP;
Toshihiko Takahashi, Nirasaki, JP;
Keisuke Suzuki, Nirasaki, JP;
Toshiyuki Ikeuchi, Nirasaki, JP;
Masayuki Hasegawa, Nirasaki, JP;
Toshihiko Takahashi, Nirasaki, JP;
Keisuke Suzuki, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A batch CVD method repeats a cycle including adsorption and reaction steps along with a step of removing residual gas. The adsorption step is preformed while supplying the source gas into the process container by first setting the source gas valve open for a first period and then setting the source gas valve closed, without supplying the reactive gas into the process container by keeping the reactive gas valve closed, and without exhausting gas from inside the process container by keeping the exhaust valve closed. The reaction step is performed without supplying the source gas into the process container by keeping the source gas valve closed, while supplying the reactive gas into the process container by setting the reactive gas valve open, and exhausting gas from inside the process container by setting the exhaust valve to gradually decrease its valve opening degree from a predetermined open state.