The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Feb. 05, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shigehiro Miura, Iwate, JP;
Hitoshi Kato, Iwate, JP;
Jun Sato, Iwate, JP;
Takeshi Kobayashi, Iwate, JP;
Masato Yonezawa, Iwate, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/302 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45525 (2013.01); C23C 16/4584 (2013.01); C23C 16/45536 (2013.01); C23C 16/45551 (2013.01); C23C 16/45578 (2013.01); C23C 16/52 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01);
Abstract
An operation method of a plasma processing device, includes performing a plasma process on a workpiece by supplying first high frequency power of a predetermined output to an electrode and generating plasma; and performing a charge storage process before the plasma process when a time interval from an end of a previous operation of the plasma processing device exceeds a predetermined interval, the charge storage process including supplying, to the electrode, second high frequency power of a lower output than the predetermined output.