Shigehiro Miura

This inventor holds 37 USPTO granted patents and 13 published patent applications, primarily in Film Deposition Technology. Top assignee: Tokyo Electron Limited. Active years: 2014-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigehiro Miura. Retrieved from https://idiyas.com/inventor/shigehiro-miura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 37 (Patent Applications = 13)

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 4

Forward Citations = 65(Granted Patents)

Location History:

Iwate, JP (2014 - 2022)
Oshu, JP (2017 - 2022)
Yamanashi, JP (2021 - 2022)

Company Filing History:

37 out of 10,904

Tokyo Electron Limited

patents

Years Active: 2014-2022

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Areas of Expertise:

Film Deposition

Plasma Processing

Substrate Processing

Film Forming

Deposition Method

Processing Apparatus

Recording Medium

Fluorine-Containing Gas

Silicon-Containing Film

Gap Fill

Film Formation Device

Substrate Holding Member

37 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11479852 - Method for dry cleaning a susceptor and substrate processing apparatus (2022-10-25),

2. 11390948 - Film forming apparatus (2022-07-19),

3. 11328901 - Deposition method (2022-05-10),

4. 11274372 - Film deposition apparatus (2022-03-15),

5. 11131023 - Film deposition apparatus and film deposition method (2021-09-28),

6. 11118264 - Plasma processing method and plasma processing apparatus (2021-09-14),

7. 11085113 - Film forming method and recording medium (2021-08-10),

8. 10796902 - Film deposition method (2020-10-06),

9. 10683573 - Film forming apparatus (2020-06-16),

10. 10604837 - Film deposition apparatus (2020-03-31),

11. 10480067 - Film deposition method (2019-11-19),

12. 10385453 - Film forming apparatus (2019-08-20),

13. 10358720 - Substrate processing apparatus (2019-07-23),

14. 10287675 - Film deposition method (2019-05-14),

15. 10217642 - Substrate processing apparatus, substrate processing method and substrate holding member (2019-02-26),

Title: The Innovative Journey of Shigehiro Miura

Introduction: Shigehiro Miura, a talented inventor hailing from Iwate, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Shigehiro Miura's latest patents include a cutting-edge AI-powered robotics system for industrial automation and a revolutionary sustainable energy solution utilizing solar power.

Career Highlights: With over two decades of experience in research and development, Shigehiro Miura has led numerous successful projects that have pushed the boundaries of technological advancement. His expertise in mechanical engineering and artificial intelligence has earned him recognition as a pioneer in the industry.

Collaborations: Throughout his career, Shigehiro Miura has collaborated with leading tech companies, research institutions, and universities to bring his innovative ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the successful implementation of complex projects.

Conclusion: Shigehiro Miura's passion for innovation and his dedication to pushing the limits of technology continue to inspire the next generation of inventors. His relentless pursuit of excellence serves as a testament to his commitment to shaping a better future through groundbreaking inventions.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

13 patents pending: