Masaru Sasaki

Title: **The Innovative Contributions of Masaru Sasaki**

Introduction

Masaru Sasaki, based in Amagasaki, Japan, is a prolific inventor, known for his significant contributions to the field of plasma processing technology. With an impressive portfolio of 36 patents, his work has paved the way for advancements in semiconductor manufacturing and plasma applications.

Latest Patents

Sasaki's latest innovations include two notable patents:

1. **Plasma processing apparatus and high-frequency power application method**: This invention features a vacuum-exhaustible processing container equipped with an electrode. It incorporates multiple power feeding portions linked to the electrode's backside, with a high-frequency power supply that delivers energy through these connections. A control unit is designed to manage the periodic application of high-frequency power to each power feeding portion, enhancing the functionality of plasma processing.

2. **Plasma etching method, method for producing semiconductor device, and plasma etching device**: This method improves the selectivity of silicon nitride films when compared to silicon oxide or silicon substrates. By regulating pressure within the processing container and generating plasma through external energy, the process enables selective etching of the silicon nitride film. The processing gas mixture includes plasma excitation gas and specific oxidizing gases, optimizing the etching process.

Career Highlights

Masaru Sasaki has made remarkable strides in his career at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work not only showcases his innovative spirit but also reflects his commitment to advancing technology that enhances industrial processes.

Collaborations

Throughout his career, Sasaki has collaborated with talented coworkers, including Takuya Sugawara and Seiji Matsuyama. Their collective expertise and innovation have contributed to the success of numerous projects within their field, further solidifying Tokyo Electron Limited's reputation for excellence.

Conclusion

Masaru Sasaki's contributions to plasma processing technologies are noteworthy, exemplifying the impact of ingenuity on modern manufacturing. His patents serve as a testament to his dedication to innovation, and his ongoing work at Tokyo Electron Limited underscores the importance of collaboration in driving technological advancements in the industry.