The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Jul. 12, 2012
Takashi Dokan, Sendai, JP;
Masaru Sasaki, Sendai, JP;
Hikaru Kamata, Sendai, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
The etching method of the present invention comprises first and second etching steps (S, S) having different types of films to be etched and different types of process gases. During a transition from the first etching step (S) to the second etching step (S), a first switching process step (S) is performed in which the process container is filled with a cleaning gas and the cleaning gas is turned into a plasma to remove the reaction product deposited in the process container in the first etching step. During a transition from the second etching step (S) to the first etching step (S), a second switching process step (S) is performed in which the process container is filled with a cleaning gas and the cleaning gas is turned into a plasma to remove the reaction product deposited in the process container in the second etching step.