Sendai, Japan

Hikaru Kamata

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hikaru Kamata. Retrieved from https://idiyas.com/inventor/hikaru-kamata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hikaru Kamata

Introduction

Hikaru Kamata is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of etching technology, particularly through his innovative patent. His work is recognized for its potential applications in various industries, including semiconductor manufacturing.

Latest Patents

Hikaru Kamata holds a patent for an etching method and device. This etching method comprises first and second etching steps that utilize different types of films and process gases. During the transition from the first etching step to the second, a cleaning gas is introduced and turned into plasma to remove any reaction products deposited in the process container. This process is reversed during the transition back to the first etching step, ensuring a clean and efficient operation. He has 1 patent to his name.

Career Highlights

Kamata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His role involves developing advanced technologies that enhance the efficiency and effectiveness of etching processes. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Hikaru Kamata has collaborated with several talented individuals in his field, including Takashi Dokan and Masaru Sasaki. These collaborations have fostered an environment of innovation and creativity, leading to advancements in etching technology.

Conclusion

Hikaru Kamata's contributions to the field of etching technology are noteworthy. His innovative patent and collaborative efforts highlight his commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in the semiconductor sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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