The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Feb. 06, 2009
Naoki Matsumoto, Hyogo, JP;
Jun Yoshikawa, Hyogo, JP;
Masaru Sasaki, Hyogo, JP;
Kazuyuki Kato, Hyogo, JP;
Masafumi Shikata, Hyogo, JP;
Shingo Takahashi, Hyogo, JP;
Naoki Matsumoto, Hyogo, JP;
Jun Yoshikawa, Hyogo, JP;
Masaru Sasaki, Hyogo, JP;
Kazuyuki Kato, Hyogo, JP;
Masafumi Shikata, Hyogo, JP;
Shingo Takahashi, Hyogo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a plasma processing apparatus featuring highly improved plasma ignition property and ignition stability by defining a positional relationship between a dielectric and the slots. A plasma processing apparatusincludes a processing chamberhaving a top opening; a dielectricwhich has inclined surfacesandon a bottom surface thereof so that a thickness dimension is successively varied, and is disposed so as to close the top opening of the processing chamber; and an antennadisposed on a top surface of the dielectric, for supplying microwave to the dielectric, thereby generating plasma at the bottom surface of the dielectric. Further, the antennais provided with a plurality of slotspositioned uprightly above the inclined surfacesand