Hyogo, Japan

Masafumi Shikata

This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masafumi Shikata. Retrieved from https://idiyas.com/inventor/masafumi-shikata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Hyogo, JP (2014)
  • Ikeda, JP (2014)

Company Filing History:


Years Active: 2014

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3 patents (USPTO):Explore Patents

Title: Masafumi Shikata: Innovator in Plasma Processing Technology

Introduction

Masafumi Shikata is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 3 patents to his name, Shikata's work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.

Latest Patents

Shikata's latest patents include innovative designs for plasma processing apparatuses and methods. One of his patents describes a plasma processing apparatus that features a dielectric plate positioned at the ceiling surface facing a susceptor within a processing chamber. This design incorporates a slot antenna with multiple microwave transmissive slots on the top surface of the dielectric plate. Additionally, a protrusion member is configured separately from the dielectric plate to prevent abnormal electric discharge. The electric field intensity near the dielectric plate can be controlled by adjusting the gap between the protrusion member and the processing chamber's sidewall or by modifying the thickness of the protrusion member.

Another patent outlines a plasma processing apparatus that includes a processing container for performing plasma processing on a substrate. This apparatus features a holding stage that supports the substrate and a dielectric plate that transmits microwave energy into the processing container. A reactive gas supply unit is also included, which supplies reactive gas for plasma processing toward the substrate's central region. The injector base of the reactive gas supply unit is strategically positioned within the dielectric plate to optimize the plasma processing.

Career Highlights

Masafumi Shikata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative ideas in plasma processing technology.

Collaborations

Shikata has collaborated with notable coworkers, including Naoki Matsumoto and Kazuyuki Kato. Their combined expertise has contributed to advancements in the field of plasma processing.

Conclusion

Masafumi Shikata's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor. His innovative designs continue to shape the future of plasma processing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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