The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Feb. 24, 2010
Applicants:
Shuuichi Ishizuka, Nirasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Tetsuro Takahashi, Nirasaki, JP;
Koji Maekawa, Nirasaki, JP;
Inventors:
Shuuichi Ishizuka, Nirasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Tetsuro Takahashi, Nirasaki, JP;
Koji Maekawa, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C25F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a gas containing nitrogen within the process chamber.