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For the Inventor, By the Inventor

Tokyo, Japan

Makoto Sugiura

This inventor holds 16 USPTO granted patents and 3 published patent applications. Top assignees: Jsr Corporation, Toyo Ink Manufacturing Company. Active years: 1993-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Sugiura. Retrieved from https://idiyas.com/inventor/makoto-sugiura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16 

% Patents Active = 93.8

Average Co-Inventor Count = 4.9

ph-index = 5

Forward Citations = 73(Granted Patents)


Location History:

  • Ibaraki, JP (2002)
  • Tokyo, JP (1993 - 2015)

Company Filing History:

goldMedal15 out of 1,078 
 
Jsr Corporation
 patents
silverMedal1 out of 223 
 
Toyo Ink Manufacturing Company
 patents

Years Active: 1993-2015

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16 patents (USPTO):Explore Patents
1. 9029069 - Resist underlayer film-forming composition and method for forming pattern (2015-05-12),
2. 9029067 - Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same (2015-05-12),
3. 8877429 - Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same (2014-11-04),
4. 8859185 - Resist underlayer film-forming composition (2014-10-14),
5. 8808974 - Method for forming pattern (2014-08-19),
6. 8802348 - Radiation-sensitive resin composition (2014-08-12),
7. 8697344 - Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern (2014-04-15),
8. 8513133 - Composition for forming resist underlayer film and method for forming pattern (2013-08-20),
9. 8501385 - Positive-type radiation-sensitive composition, and resist pattern formation method (2013-08-06),
10. 8431332 - Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern (2013-04-30),
11. 8273521 - Radiation-sensitive resin composition and compound (2012-09-25),
12. 7897821 - Sulfonium compound (2011-03-01),
13. 7812105 - Compound, polymer, and radiation-sensitive composition (2010-10-12),
14. 7297461 - Radiation sensitive resin composition (2007-11-20),
15. 6406794 - Film-forming composition (2002-06-18),

Title: The Innovative Mind of Makoto Sugiura

Introduction: Makoto Sugiura is a visionary inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Makoto Sugiura holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to problem-solving.

Career Highlights: With a career spanning over two decades, Sugiura has worked with leading research institutions and tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Makoto Sugiura has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and creativity that has led to the development of cutting-edge products and solutions.

Conclusion: Makoto Sugiura's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a trailblazer in the world of technology, inspiring the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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