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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8697344 B1

PDFFull Text
Date of Patent:
Apr. 15, 2014

Filed:

Apr. 01, 2013

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Daita Kouno, Tokyo, JP;

Norihiko Sugie, Tokyo, JP;

Gouji Wakamatsu, Tokyo, JP;

Norihiro Natsume, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Makoto Sugiura, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:

Ditthavong Mori & Steiner, P.C.

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition for forming an upper layer film includes a solvent and a resin component including a first resin having a first repeating unit and a second repeating unit. The first repeating unit is a repeating unit represented by a formula (1-1), a repeating unit represented by a formula (1-2), a repeating unit represented by a formula (1-3), or a combination thereof. The second repeating unit is a repeating unit represented by a formula (2-1), a repeating unit represented by a formula (2-2), or both thereof. The composition is to be used for forming the upper layer film in liquid immersion lithography.

Find Patent Forward Citations

Kouno, Daita. (2014). Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern (U.S. Patent No. 8697344). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8697344

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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