Company Filing History:
Years Active: 2011-2014
Title: Daita Kouno: Innovator in Photoresist Technology
Introduction
Daita Kouno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of compositions for upper layer films. With a total of 6 patents to his name, Kouno's work has had a substantial impact on the industry.
Latest Patents
Kouno's latest patents include a composition for the formation of an upper layer film and a method for the formation of a photoresist pattern. The first patent describes a composition that is used for forming an upper layer film on the surface of a photoresist film. This composition includes specific components that allow for the creation of an upper layer film with a high receded contact angle. The second patent focuses on a composition that includes a solvent and a resin component, which is essential for forming the upper layer film in liquid immersion lithography.
Career Highlights
Daita Kouno is currently employed at JSR Corporation, where he continues to innovate in the field of photoresist materials. His work has been instrumental in advancing the technology used in lithography processes, which are critical for semiconductor manufacturing.
Collaborations
Kouno has collaborated with notable colleagues such as Yukio Nishimura and Hiromitsu Nakashima. These partnerships have fostered a collaborative environment that enhances the development of innovative solutions in their field.
Conclusion
Daita Kouno's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patents and ongoing work at JSR Corporation continue to shape the future of lithography processes.