The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2013

Filed:

Oct. 13, 2011
Applicants:

Atsushi Nakamura, Tokyo, JP;

Hiroki Nakagawa, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Takayuki Tsuji, Tokyo, JP;

Hiroshi Dougauchi, Tokyo, JP;

Daita Kouno, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Inventors:

Atsushi Nakamura, Tokyo, JP;

Hiroki Nakagawa, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Takayuki Tsuji, Tokyo, JP;

Hiroshi Dougauchi, Tokyo, JP;

Daita Kouno, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of Rand Rindependently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.R—O—R  (1)


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