This inventor holds 4 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Jsr Corporation. Active years: 2010-2013.
Company Filing History:
Years Active: 2010-2013
Title: Hiroshi Dougauchi: Innovator in Photoresist Technology
Introduction
Hiroshi Dougauchi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on developing advanced materials that enhance the performance of photoresist films used in lithography.
Latest Patents
One of Hiroshi Dougauchi's latest patents is for a copolymer and top coating composition. This resin composition is designed to form a top coat on a photoresist film without causing intermixing. It maintains a stable film coating that does not elute into a medium during immersion lithography. Additionally, it preserves pattern profiles during dry exposure and can be easily dissolved in an alkaline developer. The copolymer includes recurring units with specific functional groups, achieving a weight average molecular weight between 2,000 and 100,000.
Another notable patent is for an upper layer-forming composition and photoresist patterning method. This composition consists of a resin and a solvent, where the resin is dissolvable in a developer for a photoresist film. The solvent facilitates the dissolution of the resin, which includes a compound represented by a specific formula. This innovation is crucial for forming patterns through exposure to radiation.
Career Highlights
Hiroshi Dougauchi is currently employed at JSR Corporation, a leading company in the field of advanced materials. His work at JSR Corporation has positioned him as a key player in the development of innovative solutions for the semiconductor industry.
Collaborations
Hiroshi collaborates with talented coworkers, including Hiroki Nakagawa and Yukio Nishimura. Their combined expertise contributes to the advancement of photoresist technologies and the successful execution of innovative projects.
Conclusion
Hiroshi Dougauchi's contributions to photoresist technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in lithography and semiconductor manufacturing.