The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Sep. 28, 2005
Takashi Chiba, Tokyo, JP;
Toru Kimura, Tokyo, JP;
Tomohiro Utaka, Tokyo, JP;
Hiroki Nakagawa, Tokyo, JP;
Hirokazu Sakakibara, Tokyo, JP;
Hiroshi Dougauchi, Tokyo, JP;
Takashi Chiba, Tokyo, JP;
Toru Kimura, Tokyo, JP;
Tomohiro Utaka, Tokyo, JP;
Hiroki Nakagawa, Tokyo, JP;
Hirokazu Sakakibara, Tokyo, JP;
Hiroshi Dougauchi, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of Rand Ris a fluoroalkyl group having 1 to 4 carbon atoms and Rin the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.