Tokyo, Japan

Tomohiro Utaka

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 42(Granted Patents)


Location History:

  • Ibaraki, JP (2001)
  • Chuo-ku, JP (2008)
  • Tokyo, JP (2006 - 2015)
  • Hokuto, JP (2016)

Company Filing History:


Years Active: 2001-2016

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11 patents (USPTO):Explore Patents

Title: Tomohiro Utaka: Innovator in Electrode Materials and Photoresist Technology

Introduction

Tomohiro Utaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of electrode materials and photoresist technology. With a total of 11 patents to his name, Utaka's work has had a considerable impact on the development of advanced materials for electrical storage devices.

Latest Patents

Among his latest patents, Utaka has developed an electrode active material that includes a carbon material with a specific volume of macropores ranging from 50 to 400 nm in pore diameters, achieving a volume of 0.05 to 0.40 cc/g. This innovative carbon material may consist of a composite that features a core-forming carbon material, along with a coating carbon material that covers part of the core. Additionally, he has patented an immersion upper layer film forming composition and a method for creating a photoresist pattern. This composition includes a resin and a solvent, where the resin forms a water-stable film during irradiation and dissolves in a subsequent developer. The solvent is composed of a monovalent alcohol with six or fewer carbon atoms, designed for use in immersion exposure processes.

Career Highlights

Utaka has worked with notable companies such as JSR Corporation and JM Energy Corporation. His experience in these organizations has allowed him to refine his expertise in material science and innovation.

Collaborations

Some of his notable coworkers include Takashi Chiba and Toru Kimura, who have collaborated with him on various projects throughout his career.

Conclusion

Tomohiro Utaka's contributions to the fields of electrode materials and photoresist technology highlight his innovative spirit and dedication to advancing material science. His patents reflect a commitment to developing cutting-edge solutions that address modern technological challenges.

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