The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
May. 02, 2005
Hiromitsu Nakashima, Tokyo, JP;
Tomohiro Utaka, Tokyo, JP;
Takashi Chiba, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
Hiromitsu Nakashima, Tokyo, JP;
Tomohiro Utaka, Tokyo, JP;
Takashi Chiba, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided. The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.