The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

Jul. 17, 2012
Applicants:

Toru Kimura, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Tomohiro Utaka, Tokyo, JP;

Hiroaki Nemoto, Tokyo, JP;

Atsushi Nakamura, Tokyo, JP;

Takashi Chiba, Tokyo, JP;

Hiroki Nakagawa, Tokyo, JP;

Inventors:

Toru Kimura, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Tomohiro Utaka, Tokyo, JP;

Hiroaki Nemoto, Tokyo, JP;

Atsushi Nakamura, Tokyo, JP;

Takashi Chiba, Tokyo, JP;

Hiroki Nakagawa, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/20 (2006.01); C08F 214/18 (2006.01); C08F 216/10 (2006.01); C08F 220/18 (2006.01); C08F 220/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); C08F 214/182 (2013.01); C08F 214/186 (2013.01); C08F 216/10 (2013.01); C08F 220/18 (2013.01); C08F 220/24 (2013.01); G03F 7/11 (2013.01);
Abstract

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.


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