The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Sep. 10, 2008
Daita Kouno, Tokyo, JP;
Norihiko Sugie, Tokyo, JP;
Gouji Wakamatsu, Tokyo, JP;
Norihiro Natsume, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Daita Kouno, Tokyo, JP;
Norihiko Sugie, Tokyo, JP;
Gouji Wakamatsu, Tokyo, JP;
Norihiro Natsume, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, Rrepresents hydrogen or methyl; Rand Reach represents methylene, linear or branched Calkylene, or alicyclic Calkylene; Rrepresents hydrogen or methyl; and Rrepresents a single bond, methylene, or linear or branched Calkylene.].