Tokyo, Japan

Gouji Wakamatsu

This inventor holds 18 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Fluorine-Containing Polymers. Top assignees: Jsr Corporation, Other. Active years: 2012-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gouji Wakamatsu. Retrieved from https://idiyas.com/inventor/gouji-wakamatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 94.4

 

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2012-2023

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Areas of Expertise:
Fluorine-Containing Polymer
Purification Method
Radiation-Sensitive Resin
Patterned Substrate
Film Formation
Resist Underlayer
Photoresist Pattern
Immersion Exposure
Positive-Type Composition
Miniaturizing Resin
18 patents (USPTO):Explore Patents

Title: Innovative Contributions of Gouji Wakamatsu in Polymer Technology

Introduction

Gouji Wakamatsu is a prominent inventor based in Tokyo, Japan, recognized for his significant contributions to the field of polymer technology. With a remarkable portfolio consisting of 18 patents, Wakamatsu has dedicated his career to advancing innovations that enhance the performance and applications of fluorine-containing polymers.

Latest Patents

Among his recent achievements is a groundbreaking patent focused on a novel fluorine-containing polymer, specifically designed for use in liquid immersion lithography. This innovation delivers exceptional pattern shapes and depth of focus while minimizing the elution of components in immersion liquids like water during exposure. The patent outlines a resin composition that includes a fluorine-containing polymer with a molecular weight range of 1,000-50,000, an acid-unstable resin, a radiation-sensitive acid generator, a nitrogen-containing compound, and a specialized solvent. This meticulous formulation addresses critical aspects of lithography processes, providing enhanced performance and reliability.

Career Highlights

Wakamatsu's career has been marked by his tenure at JSR Corporation, where he honed his expertise in polymer application and development. His work has significantly influenced advancements in materials used in cutting-edge technology applications, particularly in the semiconductor and electronics industries.

Collaborations

Throughout his career, Wakamatsu has collaborated with notable professionals, including Yukio Nishimura and Hiroki Nakagawa. These partnerships have fostered a dynamic exchange of ideas, resulting in innovations that push the boundaries of polymer technology and its practical applications.

Conclusion

In summary, Gouji Wakamatsu stands out as a key figure in the realm of polymer innovations. His contributions, particularly in the development of fluorine-containing polymers, continue to drive advancements in industries reliant on precision and high-performance materials. Through his patents and collaborative efforts, Wakamatsu exemplifies the spirit of innovation essential for technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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