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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9400429 B1

PDFFull Text
Date of Patent:
Jul. 26, 2016

Filed:

Mar. 10, 2015

Composition for forming a resist underlayer film, and pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Fumihiro Toyokawa, Tokyo, JP;

Shin-ya Nakafuji, Tokyo, JP;

Gouji Wakamatsu, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); C07C 279/08 (2006.01); C07C 217/18 (2006.01); G03F 7/26 (2006.01); G03F 7/09 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01); C08G 8/04 (2006.01); C08G 8/20 (2006.01); C08L 61/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 217/18 (2013.01); C07C 279/08 (2013.01); C08G 8/04 (2013.01); C08G 8/20 (2013.01); C08L 61/06 (2013.01); G03F 7/094 (2013.01); G03F 7/26 (2013.01); H01L 21/02057 (2013.01); H01L 21/0274 (2013.01); H01L 21/3081 (2013.01); H01L 21/30604 (2013.01); C07C 2103/92 (2013.01);
Abstract

A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

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