The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Sep. 16, 2014
Jsr Corporation, Tokyo, JP;
Gouji Wakamatsu, Tokyo, JP;
Masafumi Hori, Tokyo, JP;
Kouichi Fujiwara, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, Rrepresents a hydrogen atom, A represents a methylene group, Rrepresents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), Rrepresents a methylene group, Rrepresents a hydrogen atom, and n is 0 or 1, wherein each of Rrepresents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.