Company Filing History:
Years Active: 2008-2016
Title: Kouichi Fujiwara: Innovator in Radiation-Sensitive Resin Technology
Introduction
Kouichi Fujiwara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 6 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
Fujiwara's latest patents include a radiation-sensitive resin composition that features an acid-labile group-containing resin obtained through living radical polymerization. This resin is designed to be insoluble or scarcely soluble in alkali but becomes alkali soluble when exposed to acid. Another notable patent is for a resin composition used in making resist patterns insoluble, which includes a solvent and a resin with specific repeating units that enhance its performance in resist pattern formation.
Career Highlights
Kouichi Fujiwara is currently employed at JSR Corporation, where he continues to develop innovative materials for advanced applications. His work has been instrumental in improving the efficiency and effectiveness of radiation-sensitive materials.
Collaborations
Fujiwara has collaborated with notable colleagues such as Gouji Wakamatsu and Makoto Sugiura, contributing to the advancement of their shared field of expertise.
Conclusion
Kouichi Fujiwara's contributions to radiation-sensitive resin technology have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing material science.