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For the Inventor, By the Inventor

Tokyo, Japan

Kouichi Fujiwara

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Jsr Corporation. Active years: 2008-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouichi Fujiwara. Retrieved from https://idiyas.com/inventor/kouichi-fujiwara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 83.3

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal6 out of 1,078 
 
Jsr Corporation
 patents

Years Active: 2008-2016

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6 patents (USPTO):Explore Patents
1. 9348226 - Radiation-sensitive resin composition (2016-05-24),
2. 9029067 - Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same (2015-05-12),
3. 8877429 - Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same (2014-11-04),
4. 8501385 - Positive-type radiation-sensitive composition, and resist pattern formation method (2013-08-06),
5. 7704669 - Acrylic polymer and radiation-sensitive resin composition (2010-04-27),
6. 7452655 - Acrylic copolymer and radiation-sensitive resin composition (2008-11-18),

Title: Kouichi Fujiwara: Innovator in Radiation-Sensitive Resin Technology

Introduction

Kouichi Fujiwara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 6 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Fujiwara's latest patents include a radiation-sensitive resin composition that features an acid-labile group-containing resin obtained through living radical polymerization. This resin is designed to be insoluble or scarcely soluble in alkali but becomes alkali soluble when exposed to acid. Another notable patent is for a resin composition used in making resist patterns insoluble, which includes a solvent and a resin with specific repeating units that enhance its performance in resist pattern formation.

Career Highlights

Kouichi Fujiwara is currently employed at JSR Corporation, where he continues to develop innovative materials for advanced applications. His work has been instrumental in improving the efficiency and effectiveness of radiation-sensitive materials.

Collaborations

Fujiwara has collaborated with notable colleagues such as Gouji Wakamatsu and Makoto Sugiura, contributing to the advancement of their shared field of expertise.

Conclusion

Kouichi Fujiwara's contributions to radiation-sensitive resin technology have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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