The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Aug. 04, 2004
Kouichi Fujiwara, Tokyo, JP;
Hiroshi Yamaguchi, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R″ and R′″ are each hydrogen, methyl, or trifluoromethyl; Ris hydrogen, Clinear or branched alkyl, alkoxy, or Clinear or branched fluoroalkyl; X is a Cpolycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; Rand Rare each independently Clinear or branched alkyl; Ris a Calicyclic hydrocarbon group; Ris Clinear or branched alkyl; and Rand Rare each hydrogen or Clinear or branched alkyl.