Jsr Corporation

Kouichi Fujiwara

Gouji Wakamatsu

Makoto Sugiura

Hiroshi Ikeda

Hiroshi Yamaguchi

Masafumi Hori

Hiroyuki Ishii

Eiichi Kobayashi

Yukio Nishimura

Tsutomu Shimokawa

Isao Nishimura

Yong Wang

Eiji Yoneda

Yusuke Anno

A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.

Radiation-sensitive resin composition

A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, Rrepresents a hydrogen atom, A represents a methylene group, Rrepresents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), Rrepresents a methylene group, Rrepresents a hydrogen atom, and n is 0 or 1, wherein each of Rrepresents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same

A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed.

Positive-type radiation-sensitive composition, and resist pattern formation method

To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R&#x2033; and R&#x2032;&#x2033; are each hydrogen, methyl, or trifluoromethyl; Ris hydrogen, Clinear or branched alkyl, alkoxy, or Clinear or branched fluoroalkyl; X is a Cpolycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; Rand Rare each independently Clinear or branched alkyl; Ris a Calicyclic hydrocarbon group; Ris Clinear or branched alkyl; and Rand Rare each hydrogen or Clinear or branched alkyl. 

Acrylic polymer and radiation-sensitive resin composition

An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.

Acrylic copolymer and radiation-sensitive resin composition

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Tokyo, Japan

Kouichi Fujiwara