The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Dec. 24, 2003
Isao Nishimura, Tokyo, JP;
Kouichi Fujiwara, Tokyo, JP;
Eiichi Kobayashi, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Yong Wang, Tokyo, JP;
Isao Nishimura, Tokyo, JP;
Kouichi Fujiwara, Tokyo, JP;
Eiichi Kobayashi, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Yong Wang, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.