Tokyo, Japan

Norihiko Sugie

USPTO Granted Patents = 7 


Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013-2024

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7 patents (USPTO):Explore Patents

Title: Norihiko Sugie: Innovator in Chemical-Mechanical Polishing

Introduction

Norihiko Sugie is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical-mechanical polishing, holding a total of seven patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor substrate polishing processes.

Latest Patents

One of Sugie's latest patents is a composition for chemical-mechanical polishing and a method that allows for the flat and high-speed polishing of semiconductor substrates containing conductive metals such as tungsten or cobalt. This innovation not only improves the polishing speed but also reduces surface defects after the process. The composition includes silica particles with a functional group and a silane compound, which plays a crucial role in achieving the desired results.

Another notable patent involves a radiation-sensitive resin composition, which consists of a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound with a ring structure. This composition is designed to enhance the formation of resist patterns, showcasing Sugie's versatility in addressing various challenges in semiconductor manufacturing.

Career Highlights

Norihiko Sugie is currently employed at JSR Corporation, where he continues to push the boundaries of innovation in his field. His expertise in chemical-mechanical polishing has positioned him as a key figure in the semiconductor industry.

Collaborations

Sugie collaborates with talented individuals such as Norihiro Natsume and Daita Kouno, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Norihiko Sugie's contributions to the field of chemical-mechanical polishing are invaluable. His innovative patents and collaborative efforts at JSR Corporation highlight his commitment to advancing semiconductor technology.

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