The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Oct. 11, 2007
Yukio Nishimura, Tokyo, JP;
Norihiko Sugie, Tokyo, JP;
Hiromitsu Nakashima, Tokyo, JP;
Norihiro Natsume, Tokyo, JP;
Daita Kouno, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Norihiko Sugie, Tokyo, JP;
Hiromitsu Nakashima, Tokyo, JP;
Norihiro Natsume, Tokyo, JP;
Daita Kouno, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises [In the general formulas (1-1) and (1-2), Ris hydrogen or the like; Ris single bonds or the like; and Ris a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.