The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Oct. 28, 2004
Isao Nishimura, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein Rrepresents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, Rrepresents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two Rs form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining Rbeing a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein Rrepresents a hydrogen atom, fluorine atom, or trifluoromethyl group, Rrepresents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), Rrepresents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.