The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Jul. 22, 2013
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Shin-ya Minegishi, Tokyo, JP;
Yushi Matsumura, Tokyo, JP;
Shinya Nakafuji, Tokyo, JP;
Kazuhiko Komura, Tokyo, JP;
Takanori Nakano, Tokyo, JP;
Satoru Murakami, Tokyo, JP;
Kyoyu Yasuda, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/025 (2006.01); G03F 7/09 (2006.01); C08G 8/08 (2006.01); C08L 61/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08G 8/08 (2013.01); C08L 61/06 (2013.01); G03F 7/094 (2013.01);
Abstract
A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of Rto Rindividually represent a group shown by the following formula (2) or the like. Rrepresents a single bond or the like. Rrepresents a hydrogen atom or the like.