Location History:
- Higashikurume, JP (2014)
- Tokyo, JP (2013 - 2016)
Company Filing History:
Years Active: 2013-2016
Title: Satoru Murakami: Innovator in Resist Underlayer Film Technology
Introduction
Satoru Murakami is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of resist underlayer film technology, holding a total of 12 patents. His innovative work has advanced the capabilities of materials used in various applications.
Latest Patents
Murakami's latest patents include a composition for forming a resist underlayer film. This composition features a compound that includes a group represented by a specific formula. The compound is designed to include a monovalent organic group with 1 to 30 carbon atoms, ensuring that the group does not contain an oxygen atom at the end adjacent to the sulfur atom. Additionally, the compound preferably includes an aromatic or heteroaromatic ring. Another notable patent describes a method for forming a pattern, which involves providing a resist underlayer film on a substrate and using a resist composition to create a resist coating film. This process allows for the formation of a predetermined pattern on the substrate through dry-etching techniques.
Career Highlights
Throughout his career, Satoru Murakami has worked with notable companies such as JSR Corporation and Kabushiki Kaisha Toshiba. His experience in these organizations has contributed to his expertise in the field of resist technology.
Collaborations
Murakami has collaborated with talented individuals in his field, including Shin-ya Minegishi and Yushi Matsumura. These collaborations have fostered innovation and the sharing of ideas, further enhancing the development of new technologies.
Conclusion
Satoru Murakami's contributions to resist underlayer film technology and his extensive patent portfolio highlight his role as a leading inventor in this field. His work continues to influence advancements in material science and technology.