The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Aug. 30, 2011
Shin-ya Minegishi, Tokyo, JP;
Yushi Matsumura, Tokyo, JP;
Shinya Nakafuji, Tokyo, JP;
Kazuhiko Komura, Tokyo, JP;
Takanori Nakano, Tokyo, JP;
Satoru Murakami, Tokyo, JP;
Kyoyu Yasuda, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Shin-ya Minegishi, Tokyo, JP;
Yushi Matsumura, Tokyo, JP;
Shinya Nakafuji, Tokyo, JP;
Kazuhiko Komura, Tokyo, JP;
Takanori Nakano, Tokyo, JP;
Satoru Murakami, Tokyo, JP;
Kyoyu Yasuda, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, wherein Rto Rindividually represent a group shown by the following formula (2) or the like,—O—R≡R  (2)wherein Rrepresents a single bond or the like, and Rrepresents a hydrogen atom or the like.