Tokyo, Japan

Yushi Matsumura


Average Co-Inventor Count = 7.2

ph-index = 3

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2013-2016

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7 patents (USPTO):Explore Patents

Title: Yushi Matsumura: Innovator in Polysiloxane Technology

Introduction

Yushi Matsumura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of polysiloxane technology, holding a total of 7 patents. His innovative work focuses on developing advanced materials and methods for pattern formation.

Latest Patents

Matsumura's latest patents include a polysiloxane composition and a pattern-forming method. The polysiloxane composition consists of a polysiloxane and a first compound that features a nitrogen-containing heterocyclic ring structure along with a polar group or an ester group. The pattern-forming method involves coating this composition on a substrate to create a silicon-containing film. A resist composition is then applied to this film, which is selectively irradiated with a radioactive ray through a photomask to expose the resist coating film. The developed resist coating film is used to form a resist pattern, which guides the dry etching of the silicon-containing film and substrate.

Another notable patent focuses on a method for forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance. This method includes forming a resist underlayer film on a substrate, creating a resist pattern, and then using this pattern to dry etch both the resist underlayer film and the substrate. The resist underlayer film can subsequently be removed with an alkali liquid.

Career Highlights

Yushi Matsumura is currently associated with JSR Corporation, where he continues to push the boundaries of material science and engineering. His work has been instrumental in advancing technologies that are crucial for various applications in the semiconductor industry.

Collaborations

Matsumura collaborates with talented individuals such as Kazuhiko Komura and Satoru Murakami. Their combined expertise fosters an environment of innovation and creativity, leading to groundbreaking advancements in their field.

Conclusion

Yushi Matsumura's contributions to polysiloxane technology and pattern-forming methods highlight his role as a leading inventor in the industry. His innovative patents and collaborations continue to shape the future of material science.

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