The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Mar. 29, 2012
Shin-ya Minegishi, Tokyo, JP;
Yushi Matsumura, Tokyo, JP;
Shinya Nakafuji, Tokyo, JP;
Kazuhiko Komura, Tokyo, JP;
Takanori Nakano, Tokyo, JP;
Satoru Murakami, Tokyo, JP;
Kyoyu Yasuda, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Shin-ya Minegishi, Tokyo, JP;
Yushi Matsumura, Tokyo, JP;
Shinya Nakafuji, Tokyo, JP;
Kazuhiko Komura, Tokyo, JP;
Takanori Nakano, Tokyo, JP;
Satoru Murakami, Tokyo, JP;
Kyoyu Yasuda, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000, and a solvent. Each of Rto Rindependently represents a group shown by a formula (2), a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 2 to 10 carbon atoms, an aryl group having 6 to 14 carbon atoms, or a glycidyl ether group having 3 to 6 carbon atoms, wherein at least one of Rto Rrepresents the group shown by the formula (2).