The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2012

Filed:

Jul. 30, 2010
Applicants:

Mitsuo Sato, Tokyo, JP;

Kazuo Nakahara, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Takanori Nakano, Tokyo, JP;

Makoto Sugiura, Tokyo, JP;

Inventors:

Mitsuo Sato, Tokyo, JP;

Kazuo Nakahara, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Takanori Nakano, Tokyo, JP;

Makoto Sugiura, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/028 (2006.01);
U.S. Cl.
CPC ...
Abstract

A radiation-sensitive resin composition includes a compound shown by a formula (1) in which Rrepresents a divalent hydrocarbon group having 1 to 20 carbon atoms and Rrepresents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or Rand Rform a heterocyclic structure having 4 to 20 carbon atoms, Rrepresents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R, R, and Rrepresents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or Rrepresents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and Rand Rform a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.


Find Patent Forward Citations

Loading…