Mitsuo Sato

Title: Mitsuo Sato: Innovator in Radiation-Sensitive Resin Technology

Introduction

Mitsuo Sato is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, with a total of 12 patents to his name. His work has been instrumental in advancing technologies used in lithography processes.

Latest Patents

Sato's latest patents include a radiation-sensitive resin composition and a method for forming resist patterns. One of his notable inventions involves a radiation-sensitive resin composition that includes a first polymer with an acid-labile group and an acid generator that produces acid upon exposure to radiation. This composition also features a second polymer containing a fluorine atom and a functional group, which enhances its performance in lithography applications. Another significant patent focuses on a radiation-sensitive resin composition that provides a resist coating film suitable for liquid immersion lithography processes. This composition is designed to exhibit a superior water draining property and reduce development defects, thereby improving the efficiency of the lithography process.

Career Highlights

Throughout his career, Mitsuo Sato has worked with notable companies such as JSR Corporation and Mitsubishi Materials Corporation. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and radiation-sensitive materials.

Collaborations

Sato has collaborated with esteemed colleagues, including Kazuo Nakahara and Yusuke Asano. These partnerships have contributed to the development of innovative solutions in the field of lithography.

Conclusion

Mitsuo Sato's contributions to radiation-sensitive resin technology have had a lasting impact on the industry. His innovative patents and collaborations continue to influence advancements in lithography processes.