Jsr Corporation

Mitsubishi Materials Corporation

Takenaka Corporation

Jsp Corporation

Keihin Ryoko Concrete Ind. Corp.

Keihin Ryoko Concrete Industry Corporation

Takemoto Oil and Fat Corporation

Mitsuo Sato

Kazuo Nakahara

Hiromitsu Nakashima

Yusuke Asano

Toshio Yonezawa

Tomoki Nagai

Mitsuo Kinoshita

Masafumi Hori

Hitoshi Osaki

Makoto Sugiura

Takanori Kawakami

Kazuki Kasahara

Masafumi Yoshida

Takanori Nakano

Reiko Kimura

Yuusuke Asano

Hayao Aoyagi

Yasuhiko Matsuda

Yoshifumi Oizumi

Kenrou Mitsui

Tomohiro Kakizawa

Kunio Yanagibashi

Takakazu Kimoto

Yousaku Ikeo

Toru Okuno

Kenzo Kitazawa

Ken-ichi Mase

Yasuyuki Saito

Tetsuo Oura

Kenro Mitsui

Hisatsugu Yoshida

Etsurou Asakura

Tooru Okuno

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' each indicate a bonding hand bonded to R.-A-R&#x2003;&#x2003;(x).

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator. 

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, Rrepresents a hydrocarbon group having 1 to 20 carbon atoms or the like, Rto Reach independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and Rrepresents a halogen atom or the like. 

Radiation-sensitive resin composition

A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. Rin the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or &#x2014;CRR(OR), and Rto Rindependently represent a hydrogen atom or a monovalent hydrocarbon group, provided that Rand Roptionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to Rand an oxygen atom bonded to R. 

Photoresist composition, resist-pattern forming method, polymer, and compound

A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group. 

Radiation sensitive resin composition, method for forming a pattern, polymer and compound

A radiation-sensitive resin composition includes a compound, a resin and a radiation-sensitive acid generator. The compound has a structure in which a group represented by a following formula (1) is bound to a nitrogen atom. The resin has an acid-dissociative dissolution-controlling group and has a property such that alkali solubility of the resin increases by an action of an acid. In the formula (1), Y is a monovalent group having 5 to 20 carbon atoms, and '*' represents a bonding hand with the nitrogen atom. In the formula (i), R, Rand Reach independently represent a linear or branched alkyl group having 1 to 4 carbon atoms or a monovalent alicyclic hydrocarbon group having 4 to 12 carbon atoms, or Rand Rare linked with each other to form a bivalent alicyclic hydrocarbon group, and '*' represents a bonding hand with the oxygen atom. 

Radiation-sensitive resin composition and compound

A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), Rrepresents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. Rrepresents a methyl group or a trifluoromethyl group. 

Radiation-sensitive resin composition, polymer and compound

A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3). 

A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein Rrepresents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, Rrepresents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of Rmay respectively be either the same or different when p is an integer from 2 to 5, and '*' indicates a bonding hand.

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

A radiation-sensitive resin composition includes a compound shown by a formula (1) in which Rrepresents a divalent hydrocarbon group having 1 to 20 carbon atoms and Rrepresents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or Rand Rform a heterocyclic structure having 4 to 20 carbon atoms, Rrepresents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R, R, and Rrepresents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or Rrepresents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and Rand Rform a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms. 

The hydraulic substance according to the present invention comprises a certain amount of solid particles A (such as portland cement and mixed cement comprising portland cement), an average diameter thereof is 5 to 50 .mu.m, and solid particles B (such as silica fume comprising amorphous silica), an average diameter thereof is less than 1/5 of the particles A, and the particles B have such characteristic that they cohere to the surfaces of the particles A in water, and the quantity of the particles B is arranged such that they cover at least to make a single layer over the whole or part of surfaces of the particles A to cover whole or part of surfaces of particles A with particles B at least with a single layer, and the quantity of the water is arranged such that it is less than 60% of the total amount of the particles A and particles B.

Hydraulic substance with water stable particle coating

Apparatus for feeding ultrafine powder in quantitative batch operation

Growing community of inventors

Tokyo, Japan

Mitsuo Sato