The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Apr. 04, 2012
Mitsuo Sato, Tokyo, JP;
Masafumi Yoshida, Tokyo, JP;
Mitsuo Sato, Tokyo, JP;
Masafumi Yoshida, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. Rin the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CRR(OR), and Rto Rindependently represent a hydrogen atom or a monovalent hydrocarbon group, provided that Rand Roptionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to Rand an oxygen atom bonded to R.